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| (Source: Ennopia) |
SK Hynix has jointly filed a Korean patent with Ennopia Co., a Cheonan-based environmental technology company, for an invention titled "Simultaneous Removal Catalyst Apparatus of Perfluorinated Compounds and Nitrous Oxide and Catalyst System Comprising the Same" (Application No. KR1020240010802).
The patent was filed in January 2024 and published in July 2025, according to the Korean Intellectual Property Office.
The patent describes a catalyst reaction system designed to simultaneously remove perfluorinated compounds (PFCs) and nitrous oxide (N₂O) — greenhouse gases commonly emitted during semiconductor manufacturing processes. The invention utilizes a combination of thermal and catalytic reactions to decompose and purify these gases.
The system primarily consists of two integrated sections: a Heater Section, which elevates exhaust gas to high reaction temperatures, and a Catalyst Section, through which the heated gas passes for catalytic decomposition of harmful compounds.
A key feature of the invention is its integrated heater-catalyst design, which minimizes heat loss during gas transfer. The apparatus also directs heated gas upward from below, preventing dust or impurities from accumulating within the catalyst layer. By eliminating "dead zones" — inactive regions where reactions fail to occur — the system improves overall catalytic efficiency.
The patent was developed as part of a national R&D project funded by South Korea's Ministry of Environment, managed by the Korea Environmental Industry & Technology Institute (KEITI) under the Green Innovation Company Growth Support Program. The project, titled "Development of a Large-Scale Heat & Catalyst Hybrid Treatment System for Semiconductor PFCs, Fine Dust, and Secondary Byproducts," was conducted by Ennopia from April 2022 to December 2024 with government funding support.
By PatenTrip
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