AMD's Challenge to KAIST's FinFET Patent Awaits Korean Court Ruling

Decision Expected in November on AMD's Attempt to Invalidate KAIST's Dual-Gate FinFET Patent

Figure from the patent titled 'Dual-Gate FinFET' (KR0458288), owned by KAIST (Source: KIPRIS)

By PatenTrip

The Korean Patent Court is set to announce its verdict in late November 2024 on AMD's challenge to KAIST's dual-gate FinFET patent (KR0458288), a case with significant implications for the semiconductor industry. 

The patent in question covers a FinFET technology that replaces the costly Silicon-On-Insulator (SOI) substrate with a bulk silicon substrate, providing a more economical and electrically stable design by forming a nanometer-wide silicon fin that connects directly to the substrate along the current flow. This approach aims to reduce costs and enhance performance compared to traditional designs.

AMD initially contested the patent's validity in August 2021, filing an invalidation trial with the Korean Intellectual Property Tribunal (KIPT). The KIPT ultimately dismissed the case in May 2023, leading AMD to appeal to the Korean Patent Court in July 2023. A final decision is expected by the end of this month.

This patent has drawn attention from other tech giants, including Apple and Samsung Electronics, who both filed invalidation claims but later withdrew. 

Apple Korea contested claims 1–8 and 11–16 in 2018 but withdrew its challenge in May 2019 after reaching a settlement. Samsung initiated a similar invalidation attempt in July 2018, challenging claims 1–8 and 10–16, but KIPT rejected the bid in August 2019. Samsung later appealed to the Korean Patent Court but ultimately withdrew the appeal in August 2020.

Although Intel did not pursue litigation, it obtained a non-exclusive license to the KAIST patent in September 2012. The patent expired in January 2022, but its impact continues to resonate in ongoing legal battles within the industry.

By PatenTrip