Soulbrain Prevails in Semiconductor CMP Slurry Patent Challenges

Soulbrain Prevails in Semiconductor CMP Slurry Patent Challenges
(Source: Soulbrain)

Soulbrain successfully defended semiconductor polishing patents at the Korean Intellectual Property Trial and Appeal Board (IPTAB), marking another victory in ongoing disputes surrounding its CMP slurry technologies.

On March 31, 2025, the IPTAB rejected two petitions seeking the cancellation of Soulbrain's patent titled "Cerium oxide particle, chemical-mechanical polishing slurry composition comprising the same and method for manufacturing semiconductor by using the same" (KR2484583). These petitions were initially filed in June and July 2023 and were simultaneously dismissed by the IPTAB.

In South Korea, patent cancellation petitions can be filed by any party, including non-stakeholders, within six months of patent registration. Such petitions are often lodged under individual names but are typically orchestrated by potential industry competitors, including direct competitors, according to patent experts familiar with South Korea's IP landscape.

CMP (Chemical-Mechanical Polishing) slurry is a critical material used to planarize insulating and metal layers in the production of highly integrated semiconductor circuits.

Soulbrain has faced multiple challenges regarding similar CMP-related patents. Between June and July 2023, numerous cancellation requests were filed targeting various Soulbrain patents, including:

Cerium oxide particle, chemical-mechanical polishing slurry composition comprising the same and method for manufacturing semiconductor by using the same (KR2484573, KR2484625, KR2484635, KR2484634, KR2484582, KR2484570, KR2484578, KR2490006, KR2487303, KR2484637, KR2484632, KR2490003, KR2484576, KR2484572)

Chemical-mechanical polishing slurry composition and method for manufacturing semiconductor by using the same (KR2484654, KR2484641)

Cerium oxide particle and method for manufacturing the same, and method for manufacturing chemical mechanical polishing slurry composition comprising cerium oxide particle (KR2484649, KR2484643, KR2484652, KR2484653)

All petitions against these patents have either been dismissed or rejected by the IPTAB. Patent law firm Koreana Patent Firm represented petitioners in these unsuccessful cancellation attempts.

▷Related Article: Soulbrain Secures Victory in Patent Invalidation Dispute Against NEX (2024. 08. 18.)


By PatenTrip


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