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| Figures from AMAT's Korean patent KR2793647, titled "Deposition Mask and Methods of Manufacturing and Using a Deposition Mask" (Source: KIPRIS). |
Applied Materials has successfully defended a Korean patent covering deposition mask technology used in semiconductor manufacturing, after an attempt to cancel the registration was rejected.
South Korea's Intellectual Property Trial and Appeal Board on Jan. 30, 2026, issued a decision partially dismissing and partially rejecting a patent cancellation petition filed against KR2793647, titled "Deposition Mask and Methods of Manufacturing and Using a Deposition Mask." The petitioner had sought to cancel the registration of claims 1 through 18 in their entirety.
Under Korean patent law, a patent cancellation petition may be filed within six months of registration by any party, including those without a direct interest in the patent. As a result, such petitions are frequently submitted in the names of individuals and are often viewed as a tool used by competitors to challenge patents while concealing their identities.
The challenged patent relates to deposition mask structures used in pattern deposition processes that selectively deposit thin-film materials during semiconductor fabrication.
According to the patent, the mask employs an annular substrate with a mask layer spanning a central opening, a configuration designed to reduce thermal deformation and sagging during deposition. The structure is intended to improve pattern accuracy and process stability, particularly in large-area semiconductor manufacturing.
By PatenTrip
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