Kokusai Electric's Film-Thickness Nozzle Patent Canceled in Korea

Kokusai Electric's Film-Thickness Nozzle Patent Canceled in Korea
(Source: Kokusai Electric Integrated Report 2025)

The Korean Intellectual Property Trial and Appeal Board has invalidated Kokusai Electric Corp.'s Korean patent related to a film-thickness-uniformity gas nozzle.

On Dec. 3, 2025, the board issued a decision canceling the registration of Kokusai Electric's patent titled "Gas Supply Nozzle, Substrate Processing Device, Method of Manufacturing Semiconductor Device and Program" (KR2657085) following a petition for cancellation. The petition, filed in September 2024, sought the cancellation of claims 1 through 18 in their entirety.

Korean law allows any party — even those without a direct stake — to file a patent cancellation petition within six months of a patent's registration. As a result, competitors frequently submit petitions through individuals rather than in their own names.

The challenged patent covers a structural nozzle design intended to improve film-thickness uniformity on semiconductor or display substrates by optimizing gas flow within deposition equipment. The invention is applicable to ALD and CVD systems, OLED deposition processes, and other thin-film manufacturing steps used in semiconductor fabrication.


By PatenTrip

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