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| (Source: Lam Research) |
Lam Research Corp. and MKS Instruments Inc. have jointly filed two plasma control patent applications in South Korea, marking their first known collaboration on patents in the country.
The filings cover high-speed synchronization techniques for plasma source and bias power delivery systems, a core function in plasma processing tools used in semiconductor and display manufacturing. One of the patents — titled "High Speed Synchronization of Plasma Source/Bias Power Delivery" — was registered on April 22, 2025, as Korean Patent No. 2800788. The second application (No. 10-2025-7012620), a divisional of the first, remains under examination following a request filed in May 2025.
According to the public filings, the patents aim to minimize interference between multiple RF signals and enhance energy delivery efficiency, offering greater control in high-precision plasma processes. The technology is expected to support next-generation semiconductor and display fabrication platforms.
This marks the first time Lam and MKS have co-filed a patent in Korea, signaling deeper technical alignment between two major equipment suppliers in the global chipmaking ecosystem.
By PatenTrip
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