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| (Source: ASML) |
ASML has failed to secure a patent for its chip metrology data correction technology.
On April 16, 2025, the Korean Intellectual Property Trial and Appeal Board (IPTAB) ruled against ASML's request for a rehearing concerning the rejection of its patent application titled "Metrology Data Correction Using Image Quality Metric" (Application No. KR10-2021-7004720).
Earlier, the Korean Intellectual Property Office (KIPO) had denied the registration of the patent. ASML subsequently filed an appeal on February 6, 2024, challenging the rejection. The IPTAB upheld KIPO's decision. Should ASML wish to contest the IPTAB's ruling, it may file a lawsuit with the Patent Court.
ASML originally filed the patent application with KIPO on August 14, 2019. Additionally, ASML filed another patent under the same invention title with KIPO (Application No. KR10-2024-7004405). This application, also filed on August 14, 2019, was publicly disclosed in February 2024 and remains publicly available.
The technology focuses on quantifying and correcting the quality of metrology data generated through the substrate patterning process in lithography devices. The innovation aims to improve the accuracy of the patterning process and reduce errors that may occur during various manufacturing steps.
By PatenTrip
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