S. Korean IP Tribunal Rejects Two Challenges to CMP Patent
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| CMP Slurry (Source: https://www.soulbrain.co.kr/en/m21.php) |
By PatenTrip
Two attempts to cancel Soulbrain's S. Korean patent on cerium oxide particles and their application in chemical-mechanical polishing (CMP) slurry have been unsuccessful.
The Korean Intellectual Property Trial and Appeal Board (IPTAB) issued decisions on January 31, 2025, rejecting both cancellation requests against Soulbrain's patent KR2484572, titled "Cerium oxide particle, chemical-mechanical polishing slurry composition comprising the same and method for manufacturing semiconductor by using the same."
The patent covers technology aimed at improving CMP slurry performance in semiconductor manufacturing, particularly for planarization processes.
The cancellation petitions were filed in June and July 2023, challenging claims 11–15 and 17 of the patent. However, IPTAB dismissed the arguments, issuing decisions of partial dismissal and partial rejection. The remaining claims had already been deleted before the proceedings.
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| A figure from Soulbrain's patent KR2484572, titled 'Cerium oxide particle, chemical-mechanical polishing slurry composition comprising the same and method for manufacturing semiconductor by using the same' (Source: KIPRIS). |
By PatenTrip
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