A South Korean patent covering Fujifilm's light-shielding composition technology has been invalidated following a cancellation challenge at the country's patent tribunal.
Fujifilm's patent titled "Light-Shielding Composition, Cured Film, Color Filter, Light-Shielding Film, Optical Element, Solid-State Imaging Element, And Headlight Unit" (KR2630401), which was granted by the Korean Intellectual Property Office in January 2024, was cancelled on Jan. 8, 2026, according to a decision by the Korean Intellectual Property Trial and Appeal Board (KIPTAB).
A petition seeking cancellation was filed in July 2024, arguing that Claims 1, 2, 7 and 9 through 18 should be revoked. The tribunal agreed in full, cancelling the registration of all challenged claims.
The now-revoked patent related to light-shielding compositions and their application in cured films, color filters, light-shielding films, optical elements, solid-state imaging elements and headlight units. Fujifilm had positioned the invention as enabling the formation of light-shielding films with low reflectance, improved in-plane reflectance uniformity and high light-blocking performance.
Technically, the patent focused on controlling nanoparticle size and loading ratios to simultaneously achieve low reflection, uniform optical characteristics and effective light blocking in display and image-sensor applications.
Fujifilm holds several other South Korean patents that use the same representative drawings as KR2630401. These include KR2697082, KR2743645, KR2743644, KR2639398 and KR2660236, all covering variations of photosensitive or light-shielding compositions and related optical or sensor components. Each of those patents was also granted in South Korea in 2024.
By PatenTrip

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