Korean Patent Trial and Appeal Board Upholds Polishing Pad Technology
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(Source: https://www.skenpulse.com/kr/business/material_fine_ceramics?anchor=middleArea) |
By PatenTrip
SK Npulse emerged victorious in its bid to uphold its Korean patent covering a semiconductor polishing pad technology, after a petition for cancellation was partially rejected and partially dismissed by the Korean Patent Trial and Appeal Board in February 2025.
The patent in question—registered in Korea under No. 2623531 and titled "Polishing Pad and Preparation Method Thereof"—encompasses an innovative method for manufacturing polishing pads used in the chemical mechanical polishing (CMP) process. The technology incorporates biomass components to enhance eco-friendliness while optimizing key physical properties such as hardness and modulus, essential for the rigorous demands of CMP operations in semiconductor fabrication.
A cancellation petition was filed in July 2024, challenging the validity of this Korean patent. However, the Korean Patent Trial and Appeal Board ultimately ruled in favor of SK Npulse, rejecting claims that the patent should be cancelled. The board's mixed ruling—partially dismissing and partially rejecting elements of the petition—secured the patent's enforceability, reinforcing the strength of the underlying technology.
In a statement, SK Npulse emphasized the innovation behind its invention: "Our polishing pad is manufactured using a composition that includes biomass-based materials, with carefully optimized components and concentrations. This results in a product that not only meets the rigorous physical requirements of CMP processes but also offers superior environmental benefits."
Under Korean patent law, a cancellation petition may be filed within six months of a patent's registration by any party, irrespective of their direct interest—a stark contrast to the more restrictive patent invalidation process, which limits filings to patent office examiners or directly affected parties
By PatenTrip
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